Growth by Liquid-Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications-Reference-Cited by-同舟云学术

Growth by Liquid-Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications

Published:2006-03 Issue:2-3 Volume:12 Page:187-192
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Dubourdieu C.,Rauwel E.,Millon C.,Chaudouët P.,Ducroquet F.,Rochat N.,Rushworth S.,Cosnier V.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference35 articles.

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4. C. Dubourdieu, J. P. Sénateur, F. Weiss, in Crystal Growth in Thin Solid Films: Control of Epitaxy (Eds: M. Guilloux-Viry, A. Perrin), Research Signpost-Trivandrum, Kerela, India 2002, p. 169.

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