Heteroleptic Group 2 Metal Precursors for Metal Oxide Thin Films-Reference-Cited by-同舟云学术

Heteroleptic Group 2 Metal Precursors for Metal Oxide Thin Films

Published:2014-02-28 Issue:11 Volume:2014 Page:2002-2010
ISSN:1434-1948
Container-title:European Journal of Inorganic Chemistry
language:en
Short-container-title:Eur. J. Inorg. Chem.

Author:

George Sheby Mary¹,Park Bo Keun¹,Kim Chang Gyoun¹,Chung Taek‐Mo¹

Affiliation:

1. Thin Film Materials Research Group, Korea Research Institute of Chemical Technology, 141 Gajeong‐ro, Yuseong, Daejeon 305‐600, Republic of Korea, http://www.krict.re.kr/

Publisher

Wiley

Subject

Inorganic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.201301296

Reference76 articles.

2. MOCVD Routes to Thin Metal Oxide Films for superconducting electronics

3. Preparation of high‐Tcsuperconducting Bi‐Sr‐Ca‐Cu‐O films by organometallic chemical vapor deposition using second‐generation fluorocarbon‐based precursors

4. Organometallic chemical vapor deposition of highTcsuperconducting Bi‐Sr‐Ca‐Cu‐O films

5. Chemical vapour deposition of high-Tcsuperconducting thin films

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