Etching Silicon with HF–HNO 3 –H 2 SO 4 /H 2 O Mixtures – Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si–F Surface Groups-Reference-Cited by-同舟云学术

Etching Silicon with HF–HNO 3 –H 2 SO 4 /H 2 O Mixtures – Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si–F Surface Groups

Published:2012-10-08 Issue:34 Volume:2012 Page:5714-5721
ISSN:1434-1948
Container-title:European Journal of Inorganic Chemistry
language:en
Short-container-title:Eur. J. Inorg. Chem.

Author:

Lippold Marcus¹,Böhme Uwe¹,Gondek Christoph¹,Kronstein Martin¹,Patzig‐Klein Sebastian¹,Weser Martin¹,Kroke Edwin¹

Affiliation:

1. Department of Inorganic Chemistry, TU Bergakademie Freiberg, Leipziger Str. 29, 09596 Freiberg, Germany, Fax: +49‐3731‐394058, http://tu‐freiberg.de/fakult2/aoch/agsi/index.html

Publisher

Wiley

Subject

Inorganic Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.201200674

Reference52 articles.

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