Etching Silicon with HF–HNO 3 –H 2 SO 4 /H 2 O Mixtures – Unprecedented Formation of Trifluorosilane, Hexafluorodisiloxane, and Si–F Surface Groups
Author:
Affiliation:
1. Department of Inorganic Chemistry, TU Bergakademie Freiberg, Leipziger Str. 29, 09596 Freiberg, Germany, Fax: +49‐3731‐394058, http://tu‐freiberg.de/fakult2/aoch/agsi/index.html
Publisher
Wiley
Subject
Inorganic Chemistry
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/ejic.201200674
Reference52 articles.
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