Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review-Reference-Cited by-同舟云学术

Proximity gettering technology for advanced CMOS image sensors using carbon cluster ion‐implantation technique: A review

Published:2017-05-26 Issue:7 Volume:214 Page:1700216
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Kurita Kazunari¹,Kadono Takeshi¹,Okuyama Ryousuke¹,Shigemastu Satoshi¹,Hirose Ryo¹,Onaka‐Masada Ayumi¹,Koga Yoshihiro¹,Okuda Hidehiko¹

Affiliation:

1. SUMCO Corporation1‐52 Kubara, Yamashiro‐cho, Imari‐shiSaga 849‐4256Japan

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.201700216

Reference46 articles.

1. Essential Principles of Image Sensors

2. Metal Impurities in Silicon-Device Fabrication

3. Transition metals in silicon

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