Recent advances in the application of total reflection x-ray photoelectron spectroscopy in the semiconductor industry
Author:
Publisher
Wiley
Subject
Spectroscopy
Reference25 articles.
1. Ultrasoft-X-Ray Reflection, Refraction, and Production of Photoelectrons (100-1000-eV Region)
2. Enhancement of surface-atom intensities in X-ray photoelectron spectra at low X-ray incidence angles
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4. Grazing-incidence x-ray photoelectron spectroscopy from multilayer media: Oxidized GaAs(100) as a case study
5. Grazing-incidence x-ray photoemission spectroscopy investigation of oxidized GaAs(100): A novel approach to nondestructive depth profiling
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1. High resolution depth profiling using near-total-reflection hard x-ray photoelectron spectroscopy;Journal of Vacuum Science & Technology A;2021-12
2. Characterization of nuclear materials by total reflection X-ray fluorescence spectrometry;Journal of Radioanalytical and Nuclear Chemistry;2014-02-01
3. Total reflection X-ray photoelectron spectroscopy: A review;Journal of Electron Spectroscopy and Related Phenomena;2010-05
4. Evacuation of Counteranions from Langmuir Monolayers of Double-Tailed Quaternary Ammonium Ions into Subphase at High Surface Pressures as Studied by Total Reflection X-ray Absorption Spectrometry;The Journal of Physical Chemistry C;2009-06-23
5. Application of total reflection X-ray photoelectron spectroscopy to boron and phosphorus on Si wafer surface measurement;Spectrochimica Acta Part B: Atomic Spectroscopy;2004-08
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