On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements-Reference-Cited by-同舟云学术

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On the Impact of Electron Temperature in Magnetron Sputtering Benchmarked with Energy Flux Measurements

Published:2015-12 Issue:10 Volume:55 Page:701-713
ISSN:0863-1042
Container-title:Contributions to Plasma Physics
language:en
Short-container-title:Contrib. Plasma Phys.

Author:

Haase F.,Lundin D.,Bornholdt S.,Kersten H.

Funder

Deutsche Forschungsgemeinschaft under SFB TR 24/B13

Swedish Research Council (VR)

French National Center for Scientific Research (CNRS)

Publisher

Wiley

Subject

Condensed Matter Physics

Reference34 articles.

1. J. A. Thornton 11 666 1974

2. The energy balance at substrate surfaces during plasma processing

3. Average energy deposited per atom: A universal parameter for describing ion‐assisted film growth?

4. The thermalization of energetic atoms during the sputtering process

5. U. Helmersson M. Lattemann J. Bohlmark A. P. Ehiasarian J. T. Gudmundsson Thin Solid Films 513 , 1 (2006).

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