Impact of hexamethyldisiloxane admixtures on the discharge characteristics of a dielectric barrier discharge in argon for thin film deposition
Author:
Affiliation:
1. Leibniz-Institut für Plasmaforschung und Technologie (INP Greifswald); Greifswald Germany
2. Technische Universität Braunschweig; Institut für Oberflächentechnik; Braunschweig Germany
Funder
Deutsche Forschungsgemeinschaft
Collaborative Research Centre Transregio 24 “Fundamentals of Complex Plasmas”
Publisher
Wiley
Subject
Condensed Matter Physics
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