Affiliation:
1. Department of Chemistry Indian Institute of Technology Bombay Mumbai Maharashtra 400076 India
2. Department of Energy Science & Engineering Indian Institute of Technology Bombay Mumbai Maharashtra 400076 India
Abstract
AbstractThis report describes a systematic approach for precise engineering of a catalyst‐metal oxide interface through combining complementary approaches of chemical vapor deposition and atomic layer deposition. Specifically, Chemical Vapor Deposition (CVD) fabricated nanostructured hard‐carbon framework (NCF) is employed as synergistic support for precise deposition of NiOx particles through Atomic Layer Deposition (ALD). The three variants of NCF‐NiOx system (dimensions ranging from 3–12 nm, surface coverage ranging from 0.14 %–2 %) achieved exhibit unique electrocatalytic water oxidation activities, that are further strongly influenced by an external magnetic field (Hext). This confluence of size engineering and associated magnetic field effects interplay to produce the largest lowering in Rct at Hext=200 mT. A comprehensive analysis of electrocatalytic parameters including the Tafel slope and double layer capacitance establishes further insights on co‐relation of size effect and magnetic properties to understand the role of nanocarbon supported transition metal oxides in water electrolysis.