Ultrafast Interfacial Charge Transfer Initiates Mechanical Stress and Heat Transport at the Au‐TiO2 Interface

Author:

Heo Jun12ORCID,Segalina Alekos13ORCID,Kim Doyeong13ORCID,Ahn Doo‐Sik13ORCID,Oang Key Young12ORCID,Park Sungjun13,Kim Hyungjun3ORCID,Ihee Hyotcherl13ORCID

Affiliation:

1. Center for Advanced Reaction Dynamics (CARD) Institute for Basic Science (IBS) Daejeon 34141 Republic of Korea

2. Radiation Center for Ultrafast Science Korea Atomic Energy Research Institute (KAERI) Daejeon 34057 Republic of Korea

3. Department of Chemistry Korea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

Abstract

AbstractMetal‐semiconductor interfaces are crucial components of optoelectronic and electrical devices, the performance of which hinges on intricate dynamics involving charge transport and mechanical interaction at the interface. Nevertheless, structural changes upon photoexcitation and subsequent carrier transportation at the interface, which crucially impact hot carrier stability and lifetime, remain elusive. To address this long‐standing problem, they investigated the electron dynamics and resulting structural changes at the Au/TiO2 interface using ultrafast electron diffraction (UED). The analysis of the UED data reveals that interlayer electron transfer from metal to semiconductor generates a strong coupling between the two layers, offering a new way for ultrafast heat transfer through the interface and leading to a coherent structural vibration that plays a critical role in propagating mechanical stress. These findings provide insights into the relationship between electron transfer and interfacial mechanical and thermal properties.

Publisher

Wiley

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