High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers-Reference-Cited by-同舟云学术

High‐Fidelity, Sub‐5 nm Patterns from High‐χ Block Copolymer Films with Vapor‐Deposited Ultrathin, Cross‐Linked Surface‐Modification Layers

Author:

Wang Hyun Suk¹,Oh Seula²,Choi Junhwan²,Jang Wontae²,Kim Ki Hyun¹,Arellano Carlos Luis³,Huh June¹,Bang Joona¹,Im Sung Gap²^ORCID

Affiliation:

1. Department of Chemical and Biological EngineeringKorea University Seoul 02841 Republic of Korea

2. Department of Chemical and Biomolecular EngineeringKorea Advanced Institute of Science and Technology (KAIST) Daejeon 34141 Republic of Korea

3. Faculty of Pharmacy and Pharmaceutical SciencesMonash University 381 Royal Parade Parkville VIC 3052 Australia

Funder

National Research Foundation of Korea

KAIST Wearable Platform Material Technology Center

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry

Link

Reference73 articles.

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