Author:
Sameith D.,Tiller H.-J.,Breitbarth F.-W.
Subject
Condensed Matter Physics,General Materials Science,General Chemistry
Reference13 articles.
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4. Carbon tetrachloride plasma etching of GaAs and InP: A kinetic study utilizing nonperturbative optical techniques
5. Plasma etch chemistry of aluminum and aluminum alloy films
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2 articles.
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