Influence of substrate temperature and N 2 /Ar flow ratio on the stoichiometry, structure and hardness of TaNx coatings deposited by DC reactive sputtering-Reference-Cited by-同舟云学术

Influence of substrate temperature and N 2 /Ar flow ratio on the stoichiometry, structure and hardness of TaNx coatings deposited by DC reactive sputtering

Published:2015-09-10 Issue:11 Volume:47 Page:1015-1019
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Valdez K.¹^ORCID,Espinosa‐Arbeláez D. G.²,García‐Herrera J. E.²,Muñoz‐Saldaña J.²,Farias M. H.³,De la Cruz W.³

Affiliation:

1. Centro de Investigación Científica y Educación Superior de Ensenada, CICESE Carretera Tijuana‐Ensenada No 3918, Zona Playitas C.P.22860 B. C. Mexico

2. Centro de Investigación y Estudios Avanzados del IPN. Unidad Querétaro Libramiento Norponiente No. 2000 C.P. 76230 Querétaro Mexico

3. Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México Km 107 Carretera Tijuana‐Ensenada CP 22860 B.C. Mexico

Funder

Dirección General de Asuntos del Personal Académico (DGAPA) de la UNAM, Mexico

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.5808

Reference27 articles.

1. Review of the filtered vacuum arc process and materials deposition