Measurements of nitrogen atom density in a microwave‐excited plasma jet produced under moderate pressures-Reference-Cited by-同舟云学术

Measurements of nitrogen atom density in a microwave‐excited plasma jet produced under moderate pressures

Published:2020-07-22 Issue:9 Volume:15 Page:1281-1287
ISSN:1931-4973
Container-title:IEEJ Transactions on Electrical and Electronic Engineering
language:en
Short-container-title:IEEJ Trans Elec Electron Eng

Author:

Kim Jaeho¹²,Takeda Keigo³⁴,Itagaki Hirotomo¹⁵,Wang Xue‐lun¹²,Hirose Shingo⁵,Ogiso Hisato⁵,Shimizu Tetsuji¹²,Kumagai Naoto¹²,Tsutsumi Takayoshi³,Kondo Hiroki³,Hori Masaru³,Sakakita Hajime¹²

Affiliation:

1. Research Institute for Advanced Electronics and PhotonicsNational Institute of Advanced Industrial Science and Technology (AIST) Tsukuba Ibaraki Japan

2. GaN Advanced Device Open Innovation LaboratoryNational Institute of Advanced Industrial Science and Technology (AIST) Nagoya Aichi Japan

3. Center for Low‐temperature Plasma SciencesNagoya University Nagoya Aichi Japan

4. Faculty of Science and TechnologyMeijo University Nagoya Aichi Japan

5. Advanced Manufacturing Research InstituteNational Institute of Advanced Industrial Science and Technology (AIST) Tsukuba Ibaraki 305‐8564 Japan

Publisher

Wiley

Subject

Electrical and Electronic Engineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/tee.23194

Reference45 articles.

1. Comparison of N2and NH3Plasma Passivation Effects on Polycrystalline Silicon Thin-Film Transistors