Classification and Size Estimation of Wafer Defects by Using Scattered Light Distribution-Reference-Cited by-同舟云学术

Classification and Size Estimation of Wafer Defects by Using Scattered Light Distribution

Published:2015-05-06 Issue:6 Volume:98 Page:36-43
ISSN:1942-9533
Container-title:Electronics and Communications in Japan
language:en
Short-container-title:Electron Comm Jpn

Author:

SUGIHARA YOSHIHIKO¹,HONDA TOSHIFUMI²,URANO YUTA²,WATANABE MASAHIRO¹²,NOGUCHI SO¹,IGARASHI HAJIME¹

Affiliation:

1. Graduate School of Information Science and Technology; Hokkaido University; Sapporo Hokkaido Japan

2. Yokohama Research Laboratory; Hitachi, Ltd; Yokohama Kanagawa Japan

Publisher

Wiley

Subject

Applied Mathematics,Electrical and Electronic Engineering,Computer Networks and Communications,General Physics and Astronomy,Signal Processing

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ecj.11706/fullpdf

Reference9 articles.

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2. Dou L Broderick MP A new technique for automated wafer inspection and classification of particles and crystalline defects IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop 1997

3. Wafer inspection technology challenges for ULSI manufacturing;Stokowski;AIP Conf Proc,1998

4. Theoretical analysis of light scattered by particles on and crystal originated particles in wafer;Akiyama;J Jap Soc Precision Eng,2000

5. Experimental analysis of light scattered by particles on and crystal originated particles in wafer;Akiyama;J Jap Soc Precision Eng,2001

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