Analysis of Altered Layers Formed during Substrate Exfoliation of AlGaN Crystals Grown on Periodic AlN Nanopillars Using the Heated‐Pressurized Water Method

Author:

Matsubara Eri1,Yamada Ryoya1,Kondo Ryosuke1,Nishibayashi Toma1,Imoto Yoshinori1,Iwayama Sho1,Takeuchi Tetsuya1,Kamiyama Satoshi1,Maruyama Takahiro2,Miyake Hideto3,Kobayashi Shintaro4,Yamamoto Taiji4,Iwaya Motoaki1ORCID

Affiliation:

1. Department of Materials Science and Engineering Meijo University Nagoya 468‐8502 Japan

2. Department of Applied Chemistry Meijo University Nagoya 468‐8502 Japan

3. Graduate School of Electrical and Electronic Engineering Mie University Tsu 514‐8507 Japan

4. Rigaku Corporation 3‐9‐12, Matsubara‐cho Akishima‐shi Tokyo 196‐8666 Japan

Abstract

This study examines the altered layers formed during the exfoliation of AlN and AlGaN using heated‐pressurized water. Utilizing X‐ray photoelectron spectroscopy (XPS) and X‐ray diffraction (XRD), the study reveals the formation of an alteration layer on the –c‐surface of AlN and AlGaN. XPS analysis indicates a diminished N 1s peak, suggesting oxidation or hydroxylation of the –c‐plane. XRD findings demonstrate that these altered layers are polycrystalline, featuring various plane orientations, and include crystals akin to AlOOH, as confirmed by database comparisons.

Funder

Japan Society for the Promotion of Science London

New Energy and Industrial Technology Development Organization

Japan Science and Technology Corporation

Publisher

Wiley

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