Understanding Film Thickness‐Dependent Block Copolymer Self‐Assembly by Controlled Polymer Dewetting on Prepatterned Surfaces-Reference-Cited by-同舟云学术

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Understanding Film Thickness‐Dependent Block Copolymer Self‐Assembly by Controlled Polymer Dewetting on Prepatterned Surfaces

Published:2019-11-25 Issue:1 Volume:7 Page:1901605
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Brassat Katharina¹²³^ORCID,Kool Daniel¹²³,Nallet Colin G. A.¹²³,Lindner Jörg K. N.¹²³

Affiliation:

1. Nanostructuring, Nanoanalysis and Photonic Materials GroupDepartment of PhysicsPaderborn University 33098 Paderborn Germany

2. Center for Optoelectronics and Photonics Paderborn (CeOPP) 33098 Paderborn Germany

3. Institute for Lightweight Design for Hybrid materials (ILH) 33098 Paderborn Germany

Funder

Department of Mechanical Engineering, College of Engineering, Michigan State University

Society for Experimental Mechanics

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201901605

Reference45 articles.

1. Toward Lateral Length Standards at the Nanoscale Based on Diblock Copolymers

2. Towards Ordered Silicon Nanostructures through Self-Assembling Mechanisms and Processes

3. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

4. Fine Tuning of Lithographic Masks through Thin Films of PS-b-PMMA with Different Molar Mass by Rapid Thermal Processing

5. The effect of random copolymer on the characteristic dimensions of cylinder-forming PS-b-PMMA thin films

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