Electron-Blocking and Oxygen Evolution Catalyst Layers by Plasma-Enhanced Atomic Layer Deposition of Nickel Oxide-Reference-Cited by-同舟云学术

Electron-Blocking and Oxygen Evolution Catalyst Layers by Plasma-Enhanced Atomic Layer Deposition of Nickel Oxide

Published:2018-05-21 Issue:16 Volume:5 Page:1701531
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Hufnagel Alexander G.¹^ORCID,Henß Ann-Kathrin¹,Hoffmann Ramona¹,Zeman Otto E. O.¹,Häringer Sebastian¹,Fattakhova-Rohlfing Dina²³,Bein Thomas¹^ORCID

Affiliation:

1. Department of Chemistry and Center for NanoScience (CeNS); Ludwig-Maximilians-Universität München (LMU); Butenandtstr. 5-13 (E) 81377 Munich Germany

2. Forschungszentrum Jülich GmbH; Institute of Energy and Climate Research (IEK-1); Materials Synthesis and Processing; Wilhelm-Johnen-Straße 52425 Juelich Germany

3. Faculty of Engineering and Center for Nanointegration Duisburg-Essen (CENIDE); University of Duisburg-Essen; Lotharstraße 1 47057 Duisburg Germany

Funder

Deutsche Forschungsgemeinschaft

Fonds der chemischen Industrie

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201701531/fullpdf

Reference58 articles.

1. Transparent, Conducting Nb:SnO2 for Host–Guest Photoelectrochemistry