Kinetic Monte Carlo Simulation of the Growth of AlN Films by Metal Organic Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Kinetic Monte Carlo Simulation of the Growth of AlN Films by Metal Organic Chemical Vapor Deposition

Published:2019-08-22 Issue:12 Volume:256 Page:1900114
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Phys. Status Solidi B

Author:

An Jiadai¹²^ORCID,Dai Xianying¹²,Wu Wujian¹²,Guo Runqiu³,Feng Lansheng³

Affiliation:

1. School of MicroelectronicsXidian University Xi'an 710071 China

2. State Key Discipline Laboratory of Wide Bandgap Semiconductor TechnologiesXidian University Xi'an 710071 China

3. School of Mechano-Electronic EngineeringXidian University Xi'an 710071 China

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssb.201900114

Reference31 articles.

1. Epitaxial growth of cubic AlN films on (100) and (111) silicon by pulsed laser ablation

2. AlN films deposited under various nitrogen concentrations by RF reactive sputtering

3. Structural and optical characterization of AlN films grown by pulsed laser deposition

4. Epitaxial growth of AlN and Al0.5Ga0.5N layers on aluminum nitride substrates

5. Candela‐class high‐brightness InGaN/AlGaN double‐heterostructure blue‐light‐emitting diodes

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Kinetic Monte Carlo simulations for AlN and AlGaN epitaxial growth on AlN;Journal of Crystal Growth;2023-04

2. Effects of pressure on GaN growth in a specific warm-wall MOCVD reactor;CrystEngComm;2023

3. Monte Carlo and Kinetic Monte Carlo Models for Deposition Processes: A Review of Recent Works;Frontiers in Physics;2021-04-13

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