Comparative Study of Al 2 O 3 and HfO 2 for Surface Passivation of Cu(In,Ga)Se 2 Thin Films: An Innovative Al 2 O 3 /HfO 2 Multistack Design-Reference-Cited by-同舟云学术

Comparative Study of Al 2 O 3 and HfO 2 for Surface Passivation of Cu(In,Ga)Se 2 Thin Films: An Innovative Al 2 O 3 /HfO 2 Multistack Design

Published:2021-06-06 Issue:14 Volume:218 Page:2100073
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Scaffidi Romain¹²³^ORCID,Buldu Dilara G.²³⁴^ORCID,Brammertz Guy²³⁴^ORCID,de Wild Jessica²³⁴^ORCID,Kohl Thierry²³⁴^ORCID,Birant Gizem²³⁴^ORCID,Meuris Marc²³⁴^ORCID,Poortmans Jef³⁴⁵⁶^ORCID,Flandre Denis¹^ORCID,Vermang Bart²³⁴^ORCID

Affiliation:

1. ICTEAM UCLouvain Place du Levant 3/L5.03.02 Louvain-la-Neuve 1348 Belgium

2. IMEC Division IMOMEC (partner in Solliance) Wetenschapspark 1 Diepenbeek 3590 Belgium

3. Solar EnergyVille Thorpark, Poort Genk 8310 & 8320 Genk 3600 Belgium

4. Institute for Material Research (IMO) Hasselt University (partner in Solliance) Wetenschapspark 1 Diepenbeek 3590 Belgium

5. PV Department IMEC (partner in Solliance) Kapeldreef 75 Leuven 3001 Belgium

6. Department of Electrical Engineering KU Leuven Kasteelpark Arenberg 10 Heverlee 3001 Belgium

Funder

H2020 European Research Council

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202100073

Reference35 articles.

1. The 2020 photovoltaic technologies roadmap

2. Approach for Al2 O3 rear surface passivation of industrial p-type Si PERC above 19%

3. A.Morato B.Vermang H.Goverde E.Cornagliotti G.Meneghesso J.John J.Poortmans presented at 38th IEEE PVSC Austin TX June 2012.

4. Table of Contents

5. Passivation effects of atomic-layer-deposited aluminum oxide

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