Advances in Photocatalytic Disinfection: Performances and Mechanisms

Author:

Ge Lifa12,Wang Wei1,Tan Fatang1,Wang Xinyun1,Qiao Xueliang1,Wong Po Keung34ORCID

Affiliation:

1. State Key Laboratory of Materials Processing and Die & Mould Technology School of Materials Science and Engineering Huazhong University of Science and Technology Wuhan 430074 China

2. Analytical and Testing Center Huazhong University of Science and Technology Wuhan 430074 China

3. School of Life Sciences The Chinese University of Hong Kong Shatin, NT Hong Kong SAR 999077 China

4. Institute of Environmental Health and Pollution Control School of Environmental Science & Engineering Guangdong University of Technology Guangzhou 510006 China

Abstract

Photocatalytic technology is a sustainable, efficient, and eco‐friendly advanced oxidation process for addressing the hazards of microorganisms (bacteria and viruses). In this article, the latest results in the studies on the use of semiconductor photocatalysts to remove microorganisms and their related genes (DNA and RNA) from the environment, including operating conditions and removal efficiency, are summarized. The photocatalytic‐disinfection mechanism is described in detail, related to solar (especially ultraviolet light) disinfection, physical damage by sharp edges of photocatalysts, and various reactive oxygen species generated during photocatalytic processes. Also, the difficulties and challenges of photocatalytic disinfection in practical applications are discussed. With the further development of photocatalysis technology, sunlight‐driven and even indoor‐light‐driven photocatalysts will have a more promising application in environmental disinfection involving water, air, and object surfaces.

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Energy Engineering and Power Technology,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

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