Redox Chloride Elimination Reaction: Facile Solution Route for Indium-Free, Low-Voltage, and High-Performance Transistors-Reference-Cited by-同舟云学术

Redox Chloride Elimination Reaction: Facile Solution Route for Indium-Free, Low-Voltage, and High-Performance Transistors

Published:2017-01-31 Issue:3 Volume:3 Page:1600513
ISSN:2199-160X
Container-title:Advanced Electronic Materials
language:en
Short-container-title:Adv. Electron. Mater.

Author:

Liu Ao¹²³,Guo Zidong¹²³,Liu Guoxia¹²³,Zhu Chundan¹²³,Zhu Huihui³,Shin Byoungchul⁴,Fortunato Elvira⁵,Martins Rodrigo⁵,Shan Fukai¹²³

Affiliation:

1. College of Physics; Qingdao University; Qingdao 266071 China

2. College of Electronic & Information Engineering; Qingdao University; Qingdao 266071 China

3. Lab of New Fiber Materials and Modern Textile; Growing Base for State Key Laboratory; Qingdao University; Qingdao 266071 China

4. Electronic Ceramics Center; Dong-Eui University; Busan 614-714 South Korea

5. Department of Materials Science/CENIMAT-I3N; Faculty of Sciences and Technology; New University of Lisbon and CEMOP-UNINOVA; Campus de Caparica 2829-516 Caparica Portugal

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

Reference72 articles.

1. Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances

2. Boost Up Mobility of Solution-Processed Metal Oxide Thin-Film Transistors via Confining Structure on Electron Pathways

3. Synergistic Approach to High-Performance Oxide Thin Film Transistors Using a Bilayer Channel Architecture

4. Flexible metal-oxide devices made by room-temperature photochemical activation of sol–gel films

5. Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol–gel on chip’ process

Cited by 72 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-temperature processing of high-performance transparent ultra-thin ZrAlOx hybrid dielectric films via solution self-combustion synthesis and application in TFTs;Journal of Alloys and Compounds;2024-11

2. Liquid Phase Deposition of Hafnium Oxide Thin Films;IEEE Transactions on Dielectrics and Electrical Insulation;2024-08

3. Control of intrinsic ferroelectricity and structural phase in pure HfO₂ films via crystalline orientation;Journal of Physics D: Applied Physics;2024-06-19

4. Engineering High-k Oxide/CuSCN Interface for p-Channel Thin-Film Transistors;ACS Applied Electronic Materials;2024-04-19

5. Dual Role of AgNO₃ as an Oxidizer and Chloride Remover toward Enhanced Combustion Synthesis of Low-Voltage and Low-Temperature Amorphous Rare Metal-Free Oxide Thin-Film Transistors;ACS Applied Electronic Materials;2024-01-09