Preparation of fluorinated poly(aryl ether) with high dimensional stability and high temperature resistance by photo‐thermal dual crosslinking reaction

Abstract

AbstractImproving the dimensional stability is significant for fluorinated poly(aryl ether) (FPAE). In this work, zirconium tungstate (ZrW2O8) with negative thermal expansion (NTE) modified by thiol groups is successfully obtained by surface modification with 3‐(trimethoxysilyl)‐1‐propanethiol. Then, the dispersion of ZrW2O8 is improved and a certain crosslinked structure is formed by click reaction between thiols on the surface of ZrW2O8 and allyl groups on the backbone of FPAE. On this basis, the residual allyl groups on the FPAE can undergo addition reaction under heating conditions to further form crosslinked structure. Due to the introduction of photo‐thermal dual crosslinked structure, the dimensional stability of FPAE is significantly improved, and the coefficient of thermal expansion decreased by 64.3% compared to the unoptimized samples. Meanwhile, the dielectric properties are characterized with dielectric constant and dissipation factor of 3.70 and 0.008 at 1 kHz. Finally, the prepared film is used to assemble triboelectric nanogenerators, where the short‐circuit current, open‐circuit voltage and transferred charge is 3 μA, 30 V, and 10 nC, respectively. Crosslinked FPAE with high dimensional stability and high temperature resistance are successfully gained by avoiding the complexity of monomer synthesis and realizing higher performance with the same inorganic filler loading.Highlights Dual crosslinked structure is built by photo‐thermal dual crosslinking reaction. ZrW2O8 gains homogeneous dispersion in polymer matrix by photo‐crosslinking reaction. Introducing ZrW2O8 and dual crosslinked structure raises dimensional stability of film.