Copper(I) Carboxylates of Type [(nBu3P)mCuO2CR] (m = 1, 2, 3) - Synthesis, Properties, and their Use as CVD Precursors
Author:
Publisher
Wiley
Subject
Inorganic Chemistry
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/zaac.200800189/fullpdf
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1. Hot-wall chemical vapor deposition of copper from copper(I) compounds. 2. Selective, low-temperature deposition of copper from copper(I) .beta.-diketonate compounds, (.beta.-diketonate)CuLn, via thermally induced disproportionation reactions
2. A novel copper complex and CVD precursor: (.eta.2-butyne)copper(I) hexafluoroacetylacetonate
3. Copper(I), silver(I) and gold(I) carboxylate complexes as precursors in chemical vapour deposition of thin metallic films
4. Copper-Based Metallization for ULSI Applications
5. Copper-based metallization and interconnects for ultra-large-scale integration applications
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