Surface evaluation of LiNbO3 and LiTaO3 crystals etched using fluorine system gas plasma reactive ion etching
Author:
Publisher
Wiley
Subject
Electrical and Electronic Engineering,Energy Engineering and Power Technology
Reference5 articles.
1. Design of ultra-broad-band LiNbO/sub 3/ optical modulators with ridge structure
2. Microfabrication of LiNbO3by Reactive Ion-Beam Etching
3. Dry etching charactristic of LiNbO3 in plasma
4. Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterizing Inductively-Coupled-Plasma Etching of Single Crystalline Lithium Tantalate for Micro-Acoustic Applications;2023 IEEE 36th International Conference on Micro Electro Mechanical Systems (MEMS);2023-01-15
2. Inductively coupled plasma etching of LiTaO3 in CHF3/Ar plasmas;Ferroelectrics;2022-11-18
3. Specific features of the formation of optical waveguides, contact pads and electrical interconnections on lithium tantalate substrates;Journal of Physics: Conference Series;2021-11-01
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