Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling-Reference-Cited by-同舟云学术

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Influence of nonstationary atomic mixing on depth resolution in sputter depth profiling

Published:2011-10-24 Issue:5 Volume:44 Page:569-572
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Wang J. Y.¹,Liu Y.¹,Hofmann S.²,Kovac J.³

Affiliation:

1. Department of Physics; Shantou University; 243 Daxue Road Shantou 515063 Guangdong China

2. Max Planck Institute for Metals Research; Heisenbergstrasse 3 D-70569 Stuttgart Germany

3. Department of Surface Engineering and Optoelectronics F4; Jozef Stefan Institute; Jamova 39 1000 Ljubljana Slovenia

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.3855/fullpdf

Reference24 articles.

1. Profile reconstruction in sputter depth profiling

2. Evaluation of the depth resolutions of Auger electron spectroscopic, X-ray photoelectron spectroscopic and time-of-flight secondary-ion mass spectrometric sputter depth profiling techniques

3. Quantitative evaluation of sputtering induced surface roughness in depth profiling of polycrystalline multilayers using Auger electron spectroscopy

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1. Effects of sputtering induced artifacts on the determination of diffusion coefficient: Application to Ni/Cu system;Vacuum;2022-08

2. Sensitive and selective detection of DNA fragments associated with Ganoderma boninense by DNA-nanoparticle conjugate hybridisation;Journal of Materials Science;2020-07-20

3. Investigation of boron incorporation in delta doped diamond layers by secondary ion mass spectrometry;Thin Solid Films;2018-05

4. Quantitative evaluation of sputtering induced surface roughness and its influence on AES depth profiles of polycrystalline Ni/Cu multilayer thin films;Applied Surface Science;2017-07

5. Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry;Thin Solid Films;2016-05

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