Raised breakdown voltage in a high‐voltage recessed LDD‐SOI by submerged SI3N4

Author:

Daneshpajooh Reza1,Anvarifard Mohammad K.2ORCID

Affiliation:

1. Department of Electrical and Computer Engineering Ayandegan Institute of Higher Education Tonekabon Mazandaran Iran

2. Department of Engineering Sciences, Faculty of Technology and Engineering East of Guilan, University of Guilan Rudsar‐Vajargah Iran

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Computer Science Applications,Modeling and Simulation

Reference15 articles.

1. Improvement the breakdown voltage and the on‐resistance in the LDMOSFET: double buried metal layers structure;Shokouhi Shoormasti A;Silicon,2020

2. Diamond-shaped body contact for on-state breakdown voltage improvement of SOI LDMOSFET

3. Upper drift region double step partial SOI LDMOSFET: a novel device for enhancing breakdown voltage and output characteristics;Jamali Mahabadi SE;Superlattices Microstruct,2015

4. New Superjunction LDMOS With the Complete Charge Compensation by the Electric Field Modulation

5. Analytical model of LDMOS with a single step buried oxide layer

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