Intralayered Ostwald Ripening to Ultrathin Nanomesh Catalyst with Robust Oxygen-Evolving Performance-Reference-Cited by-同舟云学术

Intralayered Ostwald Ripening to Ultrathin Nanomesh Catalyst with Robust Oxygen-Evolving Performance

Published:2017-01-06 Issue:10 Volume:29 Page:1604765
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Xie Junfeng¹²,Zhang Xiaodong¹,Zhang Hao¹,Zhang Jiajia¹,Li Shuang¹,Wang Ruoxing¹,Pan Bicai¹,Xie Yi¹

Affiliation:

1. Hefei National Laboratory for Physical Sciences at the Microscale; Department of Chemistry; University of Science and Technology of China; Hefei 230026 P. R. China

2. College of Chemistry, Chemical Engineering and Materials Science; Shandong Normal University; Jinan 250014 P. R. China

Funder

National Basic Research Program of China

National Natural Science Foundation of China

Natural Science Foundation of Shandong Province

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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