Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application-Reference-Cited by-同舟云学术

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Microcontact-Printing-Assisted Access of Graphitic Carbon Nitride Films with Favorable Textures toward Photoelectrochemical Application

Published:2014-12-10 Issue:4 Volume:27 Page:712-718
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Liu Jian¹,Wang Hongqiang¹²,Chen Zu Peng¹,Moehwald Helmuth¹,Fiechter Sebastian²,van de Krol Roel²,Wen Liping³,Jiang Lei³,Antonietti Markus¹

Affiliation:

1. Max Planck Institute of Colloids and Interfaces; Research Campus Golm; Potsdam 14424 Germany

2. Helmholtz-Zentrum Berlin für Materialien und Energie GmbH; Institute for Solar Fuels; Hahn-Meitner-Platz 1 Berlin 14109 Germany

3. Key Laboratory of Organic Solids; Institute of Chemistry; Chinese Academy of Sciences; Beijing 100190 P.R. China

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference50 articles.

1. Photoelectrochemical cells

2. Bioinspired Smart Gating of Nanochannels Toward Photoelectric-Conversion Systems

3. Powering the planet: Chemical challenges in solar energy utilization

4. Amorphous TiO 2 coatings stabilize Si, GaAs, and GaP photoanodes for efficient water oxidation

5. High-Performance Silicon Photoanodes Passivated with Ultrathin Nickel Films for Water Oxidation

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