Author:
Misra Ashutosh,Hogan Jeremiah D.,Chorush Russell
Reference69 articles.
1. Post CMP cleaning using a novel HF compatible high power magasonic tank;Solid State Phenomena,1999
2. High-sensitivity particle size analysis of colloidal suspensions (CMP slurries) by SPOS: Where less becomes more;Am. lab.,2000
3. Minimization of Chemical Mechanical Planarization (CMP) defects and post-CMP cleaning;J. Vacuum Sci. Technol.,1999