Analyses of synthetic resins by application of 13C NMR-Reference-Cited by-同舟云学术

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Analyses of synthetic resins by application of 13C NMR

Published:1973-12 Issue:12 Volume:11 Page:3193-3203
ISSN:0360-6376
Container-title:Journal of Polymer Science: Polymer Chemistry Edition
language:
Short-container-title:J. Polym. Sci. Polym. Chem. Ed.

Author:

Mukoyama Y.,Tanno T.,Yokokawa H.,Fleming J.

Publisher

Wiley

Cited by 44 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Evaluation of microlithographic performance of ‘deep UV’ resists: Synthesis, and 2D NMR studies on alternating ‘high ortho’ novolak resins;Journal of Chemical Sciences;2012-03

2. Designing of high-resolution photoresists: use of modern NMR techniques for evaluating lithographic performance;Bulletin of Materials Science;2004-06

3. Quantitative estimation of the degree of derivatization: an alternative methodology using 1-D and 2-D NMR experiments;Magnetic Resonance in Chemistry;2003-12-19

4. Quantitation of microstructure of novolac resins: Development of improved one- and two-dimensional NMR methodologies;Journal of Applied Polymer Science;2003

5. Photo-induced cross-linking mechanism in azide-novolac negative photoresists: molecular level investigation using NMR spectroscopy;Magnetic Resonance in Chemistry;2003

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