Development of an Argon Gas Cluster Ion Beam for ToF‐SIMS Analysis-Reference-Cited by-同舟云学术

Development of an Argon Gas Cluster Ion Beam for ToF‐SIMS Analysis

Published:2019-08-20 Issue:9 Volume:40 Page:877-881
ISSN:1229-5949
Container-title:Bulletin of the Korean Chemical Society
language:en
Short-container-title:Bull. Korean Chem. Soc.

Author:

Lee Sang Ju¹,Choi Chang Min¹,Min Boo Ki¹,Baek Ji Young¹,Eo Jae Yeong¹,Choi Myoung Choul¹

Affiliation:

1. Mass Spectrometry and Advanced Instrumentation Research Group, Division of Scientific InstrumentationKorea Basic Science Institute Cheongju Republic of Korea

Funder

Korea Basic Science Institute

Publisher

Wiley

Subject

General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/bkcs.11840

Reference27 articles.

1. Molecular depth profiling of multilayer structures of organic semiconductor materials by secondary ion mass spectrometry with large argon cluster ion beams

2. Molecular Depth Profiling with Argon Gas Cluster Ion Beams

3. Measuring Compositions in Organic Depth Profiling: Results from a VAMAS Interlaboratory Study

4. The Magic of Cluster SIMS

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