Pure-Silica-Zeolite MFI and MEL Low-Dielectric-Constant Films with Fluoro-Organic Functionalization-Reference-Cited by-同舟云学术

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Pure-Silica-Zeolite MFI and MEL Low-Dielectric-Constant Films with Fluoro-Organic Functionalization

Published:2008-11-10 Issue:21 Volume:18 Page:3454-3460
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Lew Christopher M.,Li Zijian,Li Shuang,Hwang Son-Jong,Liu Yan,Medina Dora I.,Sun Minwei,Wang Junlan,Davis Mark E.,Yan Yushan

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference33 articles.

1. International Technology Roadmap for Semiconductors-Interconnect, 2006 Update 2006.

2. Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma

3. Organic-Functionalized Pure-Silica-Zeolite MFI Low-k Films

4. Ultra-Low-k Pure-Silica Zeolite MFI Films Using Cyclodextrin as Porogen

5. Aerogel applications

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