Effect of polymethyl methacrylate on in situ patterning of perovskite quantum dots by inkjet printing

Author:

Zheng Yaqian1,Duan Yanyu1,Ye Yun12ORCID,Zheng Xingke12,Du Aochen12,Chen Enguo12,Xu Sheng12,Guo Tailiang12

Affiliation:

1. College of Physics and Information Engineering Fuzhou University Fuzhou China

2. Fujian Science & Technology Innovation Laboratory for Optoelectronic Information of China Fuzhou China

Abstract

AbstractThe preparation of perovskite quantum dots (PQDs) using an in situ inkjet printing method is beneficial for improving the problems of aggregation and photoluminescence (PL) quenching during long‐term storage. However, the stability of PQDs prepared using this method is still not ideal, and the morphology of in situ‐printed patterns needs to be optimized. To address these problems, this study introduced polymethyl methacrylate (PMMA) into the process of in situ inkjet printing of PQDs and explored the effect of PMMA on the in situ patterning effect of PQDs. The results showed that using a mixed precursor solution containing a small amount of PMMA as the printing ink can slow down the shrinkage process of ink droplets and improve the uniformity of film formation. As the printing substrate, PMMA provided a suitable high‐viscosity environment for the in situ growth of PQDs. This could effectively suppress the coffee ring effect. In addition, the interaction between the C=O=C group in PMMA and metal ion Pb2+ in the CsPbBr3 precursor molecules was favourable to enhancing the density of PQDs. The prepared PMMA‐coated CsPbBr3 quantum dots (QDs) pattern had high stability and could maintain at 90.08% PL intensity after 1 week of exposure to air.

Funder

National Key Research and Development Program of China

Fujian Science and Technology Innovation Laboratory for Optoelectronic Information of China

Publisher

Wiley

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