A novel positive resist for deep UV lithography-Reference-Cited by-同舟云学术

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A novel positive resist for deep UV lithography

Published:1989-07 Issue:13 Volume:29 Page:856-858
ISSN:0032-3888
Container-title:Polymer Engineering and Science
language:en
Short-container-title:Polym. Eng. Sci.

Author:

Yamaoka Tsuguo,Nishiki Masashi,Koseki Ken'Ichi,Koshiba Mitsunobu

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry

Reference12 articles.

1. Japan Kokai Tokkyo Koho, 60-52845 (1985).

2. U.S. Patent No. 4,689,288 (1987).

3. Recent Advances in Thermally and Photochemically Initiated Cationic Polymerization

4. An organosilicon photoresist for use in excimer laser lithography

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