A Novel Two-Step Ammonia-Free Atomic Layer Deposition Approach for Boron Nitride-Reference-Cited by-同舟云学术

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A Novel Two-Step Ammonia-Free Atomic Layer Deposition Approach for Boron Nitride

Published:2017-08-22 Issue:9 Volume:3 Page:656-663
ISSN:2199-692X
Container-title:ChemNanoMat
language:en
Short-container-title:ChemNanoMat

Author:

Hao Wenjun¹,Marichy Catherine¹,Journet Catherine¹,Brioude Arnaud¹

Affiliation:

1. Univ Lyon, Université Claude Bernard Lyon 1; Laboratoire des Multimatériaux et Interfaces, UMR CNRS 5615; 69622 Villeurbanne France

Funder

Agence Nationale de la Recherche

China Scholarship Council

Publisher

Wiley

Subject

Materials Chemistry,Energy Engineering and Power Technology,Renewable Energy, Sustainability and the Environment,Biomaterials

Reference51 articles.

1. Hydrogen Storage in Single-Walled Carbon Nanotubes at Room Temperature

2. Boron Nitride Nanotubes and Nanosheets

3. Large area hexagonal boron nitride monolayer as efficient atomically thick insulating coating against friction and oxidation

4. Boron Nitride Nanostructures: Fabrication, Functionalization and Applications

5. Synthesis and hydrogen storage properties of different types of boron nitride nanostructures

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1. Nano Horizons: Exploring the untapped power of two-Dimensional materials;Materials Science and Engineering: B;2024-12

2. Two-step ALD process for non-oxide ceramic deposition: the example of boron nitride;Journal of Physics: Materials;2024-06-27

3. Reactive Force Field Molecular Dynamics Studies of the Initial Growth of Boron Nitride Using BCl₃ and NH₃ by Atomic Layer Deposition;The Journal of Physical Chemistry C;2024-01-16

4. Graphene-like emerging 2D materials: recent progress, challenges and future outlook;RSC Advances;2023

5. Growth mechanism study of boron nitride atomic layer deposition by experiment and density functional theory;Computational Materials Science;2023-01

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