Dielectric Relaxation of Lanthanide-Based Ternary Oxides: Physical and Mathematical Models

Author:

Zhao Chun12,Zhao C. Z.123,Tao Jing3,Werner M.24,Taylor S.2,Chalker P. R.4

Affiliation:

1. Department of Electrical and Electronic Engineering, Xi'an Jiaotong-Liverpool University, Suzhou 215123, China

2. Department of Electrical Engineering and Electronics, University of Liverpool, Liverpool L69 3GJ, UK

3. Department of Microelectronics, Xi'an Jiaotong University, Xi'an 710049, China

4. Department of Materials Science and Engineering, University of Liverpool, Liverpool L69 3GH, UK

Abstract

Cerium-doped hafnium oxides (CexHf1xO2) and lanthanum-doped zirconium oxides (LaxZr1xO2) were investigated. The highest dielectric constants,k, were obtained from lightly doped oxides with an La content ofx=0.09and a Ce content ofx=0.1, for whichk-values of33~40were obtained. The dielectric relaxation appears to be related to the size of crystal grains formed during annealing, which was dependent on the doping level. The physical and mathematical models were used to analyze the relationship betweenk-values and frequencies. The variations in thek-values up to megahertz frequencies for bothCexHf1xO2andLaxZr1xO2are simulated based on the Curie-von Schweidler (CS) or Havriliak-Negami (HN) relationships. Concerning the lightly dopedCexHf1xO2andLaxZr1xO2, the data extracted are best modeled by the HN law, whileLaxZr1xO2with doping level fromx=0.22to 0.63 are best modelled based on the CS law.

Funder

National Natural Science Foundation of China

Publisher

Hindawi Limited

Subject

General Materials Science

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