Copper Corrosion by Atmospheric Pollutants in the Electronics Industry

Abstract

Hydrogen sulphide (H2S) is considered one of the most corrosive atmospheric pollutants. It is a weak, diprotic, reducing acid, readily soluble in water and dispersed into the air by winds when emitted from natural, industrial, and anthropogenic sources. It is a pollutant with a high level of toxicity impairing human health and the environment quality. It attacks copper forming thin films of metallic sulphides or dendrite whiskers, which are cathodic to the metal substrate, enhancing corrosion. H2S is actively involved in microbially influenced corrosion (MIC) which develops in water, involving sulphur based bacteria, in oxidizing and reducing chemical reactions. H2S is found in concentrated geothermal brines, in the atmosphere of geothermal fields, and in municipal sewage systems. Other active atmospheric pollutants include SOX, NOX, and CO. This investigation reports on the effects of H2S on copper in microelectronic components of equipment and devices, with the formation of nonconductive films that lead to electrical failures.