Application of Adaptive PID Temperature Control Algorithm under Spatial Thermal Model of ALD Reaction Chamber

Author:

Liu Zhenqiang1,Lei Jinhui1ORCID,Chen Yan1,Xia Yang2,Feng Jiaheng2,Ming Shuaiqiang2,Mao Wa1

Affiliation:

1. School of Information Engineering and Automation, Kunming University of Science and Technology, Kunming, Yunnan 650500, China

2. Kemin Electronic Equipment Technology co., LTD, Jiaxing, Zhejiang 314000, China

Abstract

The study aims to expand the application of the proportion integral derivative (PID) algorithm and improve the practical application of the PID algorithm to the atomic layer deposition (ALD) process. First, the ALD process is analyzed, and the application method of the PID algorithm is determined. Second, the research conditions of the PID algorithm based on the ALD process are designed. Finally, the temperature control operation of the PID algorithm in the ALD reaction chamber is modeled and experimentally studied under different research conditions. The results show that temperature significantly impacts the reaction chambers of stainless steel and aluminum. When the heating temperature increases, the temperature of the stainless steel chamber will also change, and the maximum difference between the chamber and the heating temperature is about 33°C. In contrast, the temperature of the aluminum chamber varies little with the heating temperature. The maximum difference between the chamber temperature and heating temperature is about 350°C, which shows that the temperature of the stainless steel chamber is better controlled and is more practical under the same temperature conditions. The pressure change has little effect on the temperature change of the reaction chamber of the two materials. The temperature curves of the two chambers show that the PID temperature control system can be used normally and has strong practicability. The study provides technical support for improving the PID temperature control system and the rational use of the PID temperature control algorithm in the ALD process.

Publisher

Hindawi Limited

Subject

Electrical and Electronic Engineering,Instrumentation,Control and Systems Engineering

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