Free Radical Shadow Cure Initiated Using Two-Component and Three-Component Initiator Systems

Author:

Kitano Hajime12,Ramachandran Karthik2,Scranton Alec B.2

Affiliation:

1. Bridgestone Corporation, 3-1-1 Ogawahigashi-cho, Kodaira-shi, Tokyo 187-8531, Japan

2. Department of Chemical and Biochemical Engineering, The University of Iowa, Iowa City, IA 52242-1219, USA

Abstract

In photopolymerization systems, “shadow cure” may be defined as polymerization which extends into regions which are not illuminated by the incident initiating light source. The objective of this study is to evaluate the use of fluorescent additives for polymerization in masked regions that are unilluminated by the incident initiating light. Two different fluorescent dyes are investigated: fluorescein (FL) and eosin Y spirit soluble (EYss). A systematic series of studies was performed to characterize the effects of fluorescence intensity, the incident light intensity, and the presence of a diphenyl iodonium salt on the observed degree of shadow cure. It was concluded that shadow cure may be enhanced if one or more fluorescent compounds emit fluorescent light at wavelengths absorbed by the dye in a two- or three-component photoinitiator system. The addition of DPI to the two-component systems containing MDEA and FL or EYss led to a significant enhancement in the observed shadow cure. This result was attributed to the fact that DPI will increase both the number of active centers and the mobility of the active centers as a result of the electron transfer reactions in which it participates.

Publisher

Hindawi Limited

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,Atomic and Molecular Physics, and Optics,General Chemistry

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3