GAN-OPC-Reference-Cited by-同舟云学术

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GAN-OPC

Published:2018-06-24 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 55th Annual Design Automation Conference
language:
Short-container-title:

Author:

Yang Haoyu¹,Li Shuhe¹,Ma Yuzhe¹,Yu Bei¹,Young Evangeline F. Y.¹

Affiliation:

1. CUHK

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/3195970.3196056

Reference23 articles.

1. Design for Manufacturing With Emerging Nanolithography

2. Design for manufacturability and reliability in extreme-scaling VLSI;Yu B.;Science China Information Sciences,2016

3. A robust approach for process variation aware mask optimization;Kuang J.;Proc. DATE,2015

4. Fast Lithographic Mask Optimization Considering Process Variation

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2. Mask optimization based on conditional generative adversarial nets;2024 4th International Conference on Electronics, Circuits and Information Engineering (ECIE);2024-05-24

3. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

4. A self-training end-to-end mask optimization framework based on semantic segmentation network;Integration;2024-05

5. Open-source differentiable lithography imaging framework;DTCO and Computational Patterning III;2024-04-10

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