Basic Characteristics of a-Si:H by dc Sputtering and Application to Bandpass Filter for Shortwave Near Infrared, and Durability Evaluation
Author:
Affiliation:
1. National institute of Technology, Tokyo collage
Publisher
Surface Science Society Japan
Link
https://www.jstage.jst.go.jp/article/vss/63/9/63_20180615/_pdf
Reference15 articles.
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Film structure and optical characteristics of a-Si:H prepared with a rotary table type layer-by-layer sputtering method for application in short-wave near-infrared filters;Optical Materials Express;2022-10-04
2. Substrate Potential Dependence of Optical Characteristics of a-Si:H for Shortwave Near-infrared Filter by DC and RF Sputtering;e-Journal of Surface Science and Nanotechnology;2022-03-24
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