A Reliable Method for Fabricating sub-10 nm Gap Junctions Without Using Electron Beam Lithography-Reference-Cited by-同舟云学术

A Reliable Method for Fabricating sub-10 nm Gap Junctions Without Using Electron Beam Lithography

Published:2003 Issue: Volume:1 Page:41-44
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Naitoh Y.¹²,Tsukagoshi K.³⁴,Murata K.⁴,Mizutani W.⁴

Affiliation:

1. Motorola Labs, Corporate R&D, Motorola Japan Ltd.

2. Nanotechnology Research Institute and Research Consortium for Synthetic Nano-Function Materials Project, National Institute of Advanced Industrial Science and Technology

3. Japan Science and Technology Corporation

4. Nanotechnology Research Institute, National Institute of Advanced Industrial Science and Technology

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

http://www.jstage.jst.go.jp/article/ejssnt/1/0/1_0_41/_pdf

Reference12 articles.

1. Molecular rectifiers

2. Conductance of a Molecular Junction

3. Nanomechanical oscillations in a single-C60 transistor

4. 10 nm electron beam lithography and sub‐50 nm overlay using a modified scanning electron microscope

5. Fabrication and AFM characterization of a co-planar tunnel junction with a less than 30 nm interelectrode gap

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