Low Energy Indium or Gallium Ion Implantations to SiO<sub>2 </sub>Thin Films for Development of Novel Catalysts-Reference-Cited by-同舟云学术

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Low Energy Indium or Gallium Ion Implantations to SiO₂Thin Films for Development of Novel Catalysts

Published:2014 Issue:0 Volume:12 Page:197-202
ISSN:1348-0391
Container-title:e-Journal of Surface Science and Nanotechnology
language:en
Short-container-title:e-J. Surf. Sci. Nanotechnol.

Author:

Yoshimura Satoru¹,Kiuchi Masato¹²,Nishimoto Yoshihiro³,Yasuda Makoto³,Baba Akio³,Hamaguchi Satoshi¹

Affiliation:

1. Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University

2. National Institute of Advanced Industrial Science and Technology (AIST)

3. Department of Applied Chemistry, Graduate School of Engineering, Osaka University

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Link

https://www.jstage.jst.go.jp/article/ejssnt/12/0/12_197/_pdf

Reference22 articles.

1. [1] Y. Onishi, T. Ito, M. Yasuda, and A. Baba, Eur. J. Org. Chem., 1578 (2002).

2. [2] T. Saito, M. Yasuda, and A. Baba, Synlett., 1737 (2005).

3. [3] U. Schneider and S. Kobayashi, Angew. Chem. Int. Ed. 46, 5909 (2007).

4. [4] S. Yoshimura, K. Hine, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, Appl. Surf. Sci. 257, 192 (2010).

5. [5] S. Yoshimura, M. Kiuchi, Y. Nishimoto, M. Yasuda, A. Baba, and S. Hamaguchi, e-J. Surf. Sci. Nanotech. 10, 139 (2012).

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