Sputtering Process Model of Deposition Rate-Reference-Cited by-同舟云学术

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Sputtering Process Model of Deposition Rate

Published:1979-01 Issue:1 Volume:23 Page:24-32
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Keller J. H.,Simmons R. G.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5390875/05390879.pdf?arnumber=5390879

Cited by 73 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

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