Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors-Reference-Cited by-同舟云学术

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Development of methods for formation and testing of photoresist films with a desired thickness profile when fabricating conformal correctors

Published:2016-01-01 Issue:4 Volume:40 Page:482-488
ISSN:2412-6179
Container-title:Computer Optics
language:
Short-container-title:Kompʹût. opt.

Author:

Korolkov V. P.,Konchenko A. S.,Cherkashin V. V.,Mironnikov N. G.

Publisher

Samara State National Research University

Subject

Electrical and Electronic Engineering,Computer Science Applications,Atomic and Molecular Physics, and Optics

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Study of the Dependence of the Refractive Index of Exposed Positive Photoresists on the Conditions of Preliminary Heat Treatment;Optoelectronics, Instrumentation and Data Processing;2022-12

2. Modified method of direct laser writing radially symmetric structures;Journal of Physics: Conference Series;2018-09

3. Analytical features of extended Airy beams;Journal of Physics: Conference Series;2018-09

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