Post-thinning using Ar ion-milling system for transmission electron microscopy specimens prepared by focused ion beam system
Author:
Affiliation:
1. Advanced Process and Materials R&D Group, Incheon Regional Division; Korea Institute of Industrial Technology; Incheon Republic of Korea
Funder
Korea Institute of Industrial Technology
Publisher
Wiley
Subject
Histology,Pathology and Forensic Medicine
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/jmi.12324/fullpdf
Reference19 articles.
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2. Method of preparing Si and Ge specimens for examination by transmission electron microscopy;Booker;Br. J. Appl. Phys.,1962
3. Relativistic Hartree-Fock X-ray and electron scattering factors;Doyle;Acta Cryst,1968
4. 2 keV Ga+ FIB milling for reducing amorphous damage in silicon;Giannuzzi;Microsc. Microanal.,2005
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