Glass etching with gaseous hydrogen fluoride: Rapid management of surface nano‐roughness-Reference-Cited by-同舟云学术

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Glass etching with gaseous hydrogen fluoride: Rapid management of surface nano‐roughness

Published:2022-04-04 Issue:4 Volume:13 Page:676-683
ISSN:2041-1286
Container-title:International Journal of Applied Glass Science
language:en
Short-container-title:Int J of Appl Glass Sci

Author:

Ono Yoshitaka¹²,Hayashi Yasuo¹,Urashima Shu‐hei²³^ORCID,Yui Hiroharu²³^ORCID

Affiliation:

1. Innovative Technology Laboratories AGC Inc. 1‐1 Suehiro‐cho, Tsurumi‐ku Yokohama Kanagawa Japan

2. Department of Chemistry Faculty of Science Tokyo University of Science 1‐3 Kagurazaka, Shinjuku Tokyo Japan

3. Water Frontier Research Center Research Institute for Science and Technology Tokyo University of Science 1‐3 Kagurazaka, Shinjuku Tokyo Japan

Publisher

Wiley

Subject

General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/ijag.16577

Reference28 articles.

1. Modeling and Recipe Optimization of Anti-Glare Process Using Sandblasting for Electronic Display Glass

2. Determination of the correlation between physical measurements of roughness, optical properties, and perception of frosted glass surfaces

3. Contact charge transfer between inorganic dielectric solids of different surface roughness

4. Characteristics of electrical charging on smooth and rough surfaces of glass plates under vacuum

5. Electrification of glass substrate surface by plasmas

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Etching selectivity of SiO₂ to SiN using HF and methanol at higher pressures up to 900 Pa;Japanese Journal of Applied Physics;2024-06-03

2. Fabrication of Superhydrophobic Nanostructures on Glass Surfaces Using Hydrogen Fluoride Gas;ACS Omega;2024-02-27

3. The role of silanol groups on the reaction of SiO₂ and anhydrous hydrogen fluoride gas;Journal of the American Ceramic Society;2023-03-09

4. Prediction of glassy silica etching with hydrogen fluoride gas by kinetic Monte Carlo simulations;The Journal of Chemical Physics;2023-03-01

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