Metalorganic Chemical Vapor Deposition by Pulsed Liquid Injection Using an Ultrasonic Nozzle: Titanium Dioxide on Sapphire from Titanium(IV) Isopropoxide-Reference-Cited by-同舟云学术

Metalorganic Chemical Vapor Deposition by Pulsed Liquid Injection Using an Ultrasonic Nozzle: Titanium Dioxide on Sapphire from Titanium(IV) Isopropoxide

Published:1995-10 Issue:10 Volume:78 Page:2763-2768
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:

Author:

Versteeg Vera A.,Avedisian C. Thomas,Raj Rishi

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1995.tb08052.x/fullpdf

Reference15 articles.

1. Structural Properties of Epitaxial TiO2 Films Grown on Sapphire (1120) by MOCVD;Chang;J. Mater. Res.,1992

2. Solution Precursor Chemical Vapor Deposition of Titanium Oxide Thin Films;Lu;Thin Solid Films.,1991

3. Preparation of Ferroelectric BaTiO3 Thin Films by Metal Organic Chemical Vapour Deposition;Lee;J. Mater. Sci.: Mater. Electron.,1990

4. Liquid Source CVD;McMillan;Integr. Ferroelectr.,1992

5. Preparation and Characterization of MgO Thin Films Deposited by Spray Pyrolysis of Mg(2,4-pentanedionate)2;DeSisto;J. Cryst. Growth.,1990

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