Mechanical Properties and Microstructural Characterization of Amorphous SiC x N y Thin Films After Annealing Beyond 1100°C-Reference-Cited by-同舟云学术

Mechanical Properties and Microstructural Characterization of Amorphous SiC x N y Thin Films After Annealing Beyond 1100°C

Published:2015-12-12 Issue:3 Volume:99 Page:996-1005
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J. Am. Ceram. Soc.

Author:

Ctvrtlik Radim¹,Kulikovsky Valeriy²³,Vorlicek Vladimir²,Tomastik Jan¹,Drahokoupil Jan²,Jastrabik Lubomir¹

Affiliation:

1. Regional Centre of Advanced Technologies and Materials Joint Laboratory of Optics of Palacký University and Institute of Physics AS CR Faculty of Science Palacký University 17. listopadu 12 Olomouc 771 46 Czech Republic

2. Institute of Physics Academy of Sciences of the Czech Republic Na Slovance 2 182 21 Prague 8 Czech Republic

3. Institute for Problems of Materials Science Academy of Sciences of Ukraine 3 Krzhyzhanovsky St. 03142 Kiev Ukraine

Funder

Ministerstvo Školství, Mládeže a Tělovýchovy

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.14057

Reference34 articles.

1. Effect of air annealing on mechanical properties and structure of SiCxNy magnetron sputtered films

2. Silicon carbonitride: a rival to cubic boron nitride

3. Relationship of chemical and structural properties with the tribological behavior of sputtered SiCN films

4. Structural and Optical Investigations of Silicon Carbon Nitride Thin Films Deposited by Magnetron Sputtering

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