Development of Exposure Method for Wiring Pattern on High Aspect Structures-Reference-Cited by-同舟云学术

Development of Exposure Method for Wiring Pattern on High Aspect Structures

Published:2005 Issue:6 Volume:125 Page:280-281
ISSN:1341-8939
Container-title:IEEJ Transactions on Sensors and Micromachines
language:en
Short-container-title:IEEJ Trans. SM

Author:

Hanai Kei¹,Tamura Yoshiaki¹,Matsumoto Yoshinori¹

Affiliation:

1. Faculty of Science and Technology, Department of Applied Physycs and Physico-Imformatics, Keio University

Publisher

Institute of Electrical Engineers of Japan (IEE Japan)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

https://www.jstage.jst.go.jp/article/ieejsmas/125/6/125_6_280/_pdf

Reference4 articles.

1. (1) Y. Nonomura, M. Fujiyoshi, Y. Omura, K. Tsukada, M. Okuwa, T. Morikawa, N. Sugitani, S. Satou, N. Kurata, and S. Matsushige: “Quartz rate gyro sensor for automotive control”, Sensors and Actuators A Vol. 110, pp. 136-141 (2004)

2. (2) K. Tamura: “Outline of Electro-deposition Photoresist System”, SHIKIZAI KYOKAISHI (Journal of the Japan Society of Colour Material), Vol. 77, No. 4, pp. 184-187 (2004) (in Japanese)

3. (3) M. Sasaki, S. Nogawa, and K. Hane: “Spray coating of Photoresist for three dimensional micromachining”, T. IEE Japan, Vol. 122-E, No. 5 pp. 235-243 (2002-5) (in Japanese)

4. (4) A. Kado, T. Sakai, and Y. Matsumoto: “Study of photolithography for 45°silicon plane”, Proceedings of the 19th Sensor Symposium, pp. 347-350 (2002)

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1. Proposal of High-Density Packaging Construction and Conductive Pattern Forming Method on Vertical Wall Using Spray Coating Technology;IEEJ Transactions on Sensors and Micromachines;2011

2. Exposure Method for Three-Dimensional Samples Using Phase Shift Mask;IEEJ Transactions on Sensors and Micromachines;2006